• DocumentCode
    1830818
  • Title

    Effect of self-diffraction on erasure dynamics during readout at different wavelengths and geometries in photorefractive materials

  • Author

    Jeganathan, M. ; Bashaw, M.C. ; Aharoni, A. ; Hesselink, L.

  • Author_Institution
    Dept. of Electr. Eng., Stanford Univ., CA, USA
  • fYear
    1994
  • fDate
    25-29 Jul 1994
  • Firstpage
    183
  • Lastpage
    184
  • Abstract
    Certain memory applications based on photorefractive media require the ability to conveniently fix holograms. An attractive alternative is to sufficiently prolong the readout time. Low photoexcitation at long wavelength augmented by self-diffraction can increase readout time by a few orders of magnitude. The interaction of the writing and readout waves, both of the same wavelength, with the photorefractive space charge field has been investigated theoretically and experimentally. Dynamics of beam coupling and self diffraction, in certain geometries, can lead to an initial increase followed by non-exponential decay of the diffracted signal during readout. Here we study how the difference in gain, lifetime, photoexcitation and absorption at different wavelengths - which require changing incident angles to satisfy the Bragg condition - affect the decay dynamics of photorefractive gratings
  • Keywords
    holographic gratings; light diffraction; nonlinear optics; photorefractive effect; 514.5 nm; 632.8 nm; Bragg condition; absorption; beam coupling; erasure dynamics during readout; fix holograms; gain; geometries; lifetime; low photoexcitation at long wavelength; memory applications; photoexcitation; photorefractive gratings; photorefractive materials; photorefractive space charge field; self-diffraction; wavelengths; Absorption; Bragg gratings; Diffraction gratings; Geometry; Optical coupling; Optical propagation; Photorefractive effect; Photorefractive materials; Space charge; Writing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nonlinear Optics: Materials, Fundamentals, and Applications, 1994. NLO '94 IEEE
  • Conference_Location
    Waikoloa, HI
  • Print_ISBN
    0-7803-1473-5
  • Type

    conf

  • DOI
    10.1109/NLO.1994.470841
  • Filename
    470841