DocumentCode
1832694
Title
Electrothermal nonlinear FET modeling for spectral prediction
Author
Baylis, Charles ; Dunleavy, Larry
Author_Institution
Dept. of Electr. & Comput. Eng., Baylor Univ., Waco, TX, USA
fYear
2009
fDate
17-21 Aug. 2009
Firstpage
95
Lastpage
98
Abstract
The origin, mechanisms, and modeling of nonlinearities responsible for spectral spreading are reviewed and discussed. Intermodulation distortion, responsible for spectral spreading, is affected by slow memory effects. Pulsed IV measurements are used to obtain model current equations that have appropriate steady-state quiescent bias dependences related to channel temperature and trap occupancy. Thermal resistance can be measured in silicon devices by using ambient temperature adjustments to measure channel temperature changes due to quiescent self-heating. The presence of trap states in GaN HEMTs makes the assessment of thermal resistance much more difficult; however, the presence of these effects can be determined by comparing two sets of IV curves taken from quiescent bias points of equal power dissipation. Results are presented showing accurate prediction of third-, fifth-, and seventh-order intermodulation projects using an electrothermal model for a power Si MOSFET.
Keywords
gallium compounds; high electron mobility transistors; intermodulation distortion; power MOSFET; semiconductor device measurement; semiconductor device models; thermal resistance; GaN; GaN HEMT; Si; electrothermal model; intermodulation distortion; power Si MOSFET; power dissipation; quiescent self-heating; slow memory effects; spectral spreading; thermal resistance; trap states; Current measurement; Distortion measurement; Electrical resistance measurement; Electrothermal effects; FETs; Intermodulation distortion; Predictive models; Pulse measurements; Temperature measurement; Thermal resistance;
fLanguage
English
Publisher
ieee
Conference_Titel
Electromagnetic Compatibility, 2009. EMC 2009. IEEE International Symposium on
Conference_Location
Austin, TX
Print_ISBN
978-1-4244-4266-9
Electronic_ISBN
978-1-4244-4058-0
Type
conf
DOI
10.1109/ISEMC.2009.5284588
Filename
5284588
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