Comprehensive cycle time reduction program at AMD´s fab25

Author

Sadjadi, Farzad ; Baker, Tony

Author_Institution

Adv. Micro Devices Inc., Austin, TX, USA

fYear

2001

fDate

2001

Firstpage

95

Lastpage

98

Abstract

Manufacturing cycle time at AMD´s Fab25 Austin, Texas facility has improved from the bottom third to the top of Sematech´s cycle time per mask layer metric list. Steady improvement in cycle time performance has been attained in the midst of a steep ramp from 0.25 μm to 0.18 μm technology. This paper explains the fundamental changes that were made to accomplish these improvements and evaluate their impact upon Fab25´s cycle time reduction efforts. Focus areas of interest are: philosophy and behavior, modeling, dispatching, planning, and operations

Keywords

computer aided production planning; computer integrated manufacturing; dispatching; integrated circuit yield; manufacturing resources planning; production control; strategic planning; ClusterSim; WIP management; comprehensive cycle time reduction program; cycle time per mask layer metric list; cycle time prediction; dispatching; factory modeling; integrated planning system; manufacturing cycle time; plan evaluations; strategic improvements; Dispatching; Engineering management; Industrial engineering; Job shop scheduling; Manufacturing processes; Microprocessors; Production facilities; Relays; Semiconductor device modeling; Strategic planning;

fLanguage

English

Publisher

ieee

Conference_Titel

Semiconductor Manufacturing Symposium, 2001 IEEE International

Conference_Location

San Jose, CA

Print_ISBN

0-7803-6731-6

Type

conf

DOI

10.1109/ISSM.2001.962923

Filename

962923