• DocumentCode
    1840546
  • Title

    Advanced PSA Bipolar Transistors for Wireless Applications: Measurements of Scattering Parameters and Noise Figure

  • Author

    Caddemi, A. ; Sannino, M.

  • Author_Institution
    Dipartimento di Ingegneria Elettrica - University of Palermo, Viale delle Scienze - 90128 Palermo - Italy
  • Volume
    26
  • fYear
    1994
  • fDate
    Dec. 1994
  • Firstpage
    98
  • Lastpage
    104
  • Abstract
    A complete investigation on the performance of a series of double polysilicon self-aligned (PSA) bipolar transistors in terms of scattering parameters and noise figure is here reported. The devices have been characterized over the 1-4 GHz frequency range in several bias conditions to the aim of assessing the optimum bias values for the best trade-off between noise and gain performance. This is the first part of an extensive investigation currently performed on 5 families of PSA devices having different emitter configuration and size which have been manufactured by SGS-Thomson to undergo a comparative analysis on the global transistor performance.
  • Keywords
    Bipolar transistors; Frequency; Integrated circuit noise; Manufacturing; Noise figure; Noise measurement; Performance gain; Scattering parameters; Semiconductor device measurement; Testing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    ARFTG Conference Digest-Fall, 44th
  • Conference_Location
    Boulder, CO, USA
  • Print_ISBN
    0-7803-5686-1
  • Type

    conf

  • DOI
    10.1109/ARFTG.1994.327086
  • Filename
    4119761