• DocumentCode
    1845291
  • Title

    Characterization of On-Wafer Diode Noise Sources

  • Author

    Randa, J. ; Walker, D. ; Dunleavy, L. ; Billinger, R. ; Rice, J.

  • Author_Institution
    Electromagnetic Fields Division, National Institute of Standards and Technology, Boulder, CO 80303
  • Volume
    33
  • fYear
    1998
  • fDate
    35947
  • Firstpage
    53
  • Lastpage
    61
  • Abstract
    A set of wafer probeable diode noise source transfer standards are characterized using on-wafer noise temperature methods developed recently at the National Institute of Standards and Technology (NIST). This paper reviews the methods for accurate on-wafer measurements of noise temperature and details the preliminary design and construction of the transfer standards. Measurements are presented of their noise temperatures at frequencies from 8 to 12 GHz. Such transfer standards could be used in interlaboratory comparisons or as a verification tool for checking on-wafer noise calibration accuracy.
  • Keywords
    Calibration; Cryogenics; Diodes; Electromagnetic interference; Measurement standards; NIST; Noise figure; Noise measurement; Radiometry; Temperature measurement; Noise; noise characterization; noise measurement; noise source; noise temperature; on-wafer measurement;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    ARFTG Conference Digest-Spring, 51st
  • Conference_Location
    Baltimore, MD, USA
  • Print_ISBN
    0-7803-5686-1
  • Type

    conf

  • DOI
    10.1109/ARFTG.1998.327277
  • Filename
    4119966