DocumentCode
1850550
Title
Development of 3-axis nano stage for precision positioning in lithography system
Author
Lee, Dong-Ju ; Lee, Kang-Nyung ; Park, No-Cheol ; Park, Young-Pil ; Kim, Hyuk ; Lee, Suk-Won ; Choi, Hyoung Gil ; Lee, Moon Gu ; Uh, Jiho ; Park, Jung-Woo ; Choi, Yong-Hwan ; Lee, Dong-Jin
Author_Institution
Center for Inf. Storage Device, Yonsei Univ., Seoul, South Korea
Volume
3
fYear
2005
fDate
2005
Firstpage
1598
Abstract
The precision positioning system requires robust structural design to obtain enough bandwidth and efficient magnetic circuit to have fast access time. In this paper, the 3-axis nano stage was proposed and dynamic characteristics was improved by design of experiments (DOE) based on specifications of our precision positioning device. Finally, it was checked that the designed actuator had the proper dynamic characteristics through dynamic experiments.
Keywords
design of experiments; nanolithography; position control; semiconductor device manufacture; 3-axis nano stage; design of experiments; lithography system; precision positioning system; robust structural design; Bandwidth; Coils; DC motors; Hydraulic actuators; Iron; Lithography; Magnetic circuits; Robustness; Semiconductor device manufacture; US Department of Energy;
fLanguage
English
Publisher
ieee
Conference_Titel
Mechatronics and Automation, 2005 IEEE International Conference
Conference_Location
Niagara Falls, Ont., Canada
Print_ISBN
0-7803-9044-X
Type
conf
DOI
10.1109/ICMA.2005.1626794
Filename
1626794
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