Automatic parameter control system for semiconductor structures manufacturing

Author

Starostenko, Oleg ; Luna, José G Vázquez ; Khoma, Vladimir

Author_Institution

Dept. en Sistemas Comput., Univ. de las Americas Puebla, Mexico

fYear

1999

fDate

1999

Firstpage

69

Lastpage

72

Abstract

This paper describes analysis of measurement equipment design concepts and some advances in our research regarding the construction of computer based facilities for electrical and non-electrical complex parameters measurements of semiconductor structures. CV- and GV-characteristics system has been designed and used for automatic parameter control of semiconductors production particularly for technological process control of the charge-coupled CCD device manufacturing. The proposed measuring system has been analyzed to estimate performance of semiconductor characteristics acquisition and processing. That information is used as a feedback action to improve a technological process of the CCD structure manufacturing

Keywords

integrated circuit manufacture; integrated circuit measurement; parameter estimation; process control; CCD structure; CV-characteristics; GV-characteristics; automatic parameter control; automatic parameter control system; complex parameters measurements; computer based facilities; measurement equipment design concepts; semiconductor characteristics acquisition; semiconductor structures manufacturing; technological process; technological process control; Automatic control; Charge coupled devices; Control systems; Electric variables measurement; Manufacturing automation; Manufacturing processes; Performance analysis; Process control; Production systems; Semiconductor device manufacture;

fLanguage

English

Publisher

ieee

Conference_Titel

Design of Mixed-Mode Integrated Circuits and Applications, 1999. Third International Workshop on

Conference_Location

Puerto Vallarta

Print_ISBN

0-7803-5588-1

Type

conf

DOI

10.1109/MMICA.1999.833598

Filename

833598