DocumentCode
185800
Title
Long term stability and quality factors of degenerately n-type doped silicon resonators
Author
Jaakkola, Anttoni ; Gorelick, Sergey ; Prunnila, Mika ; Dekker, James ; Pensala, Tuomas ; Pekko, Panu
Author_Institution
VTT Tech. Res. Centre of Finland, Espoo, Finland
fYear
2014
fDate
19-22 May 2014
Firstpage
1
Lastpage
5
Abstract
Effect of degenerate doping on the long term stability and quality factors of silicon resonators was studied. The long term stability of electrostatically coupled tuning fork and width extensional mode resonators was found to be better than 1 ppm during a measurement spanning 220 days. Resonators were phosphorus doped to a carrier concentration of 4.1×1019cm-3. Quality factors of ~10-MHz Lamé mode resonators on wafers doped up to a concentration of 7.5 × 1019cm-3 were found to range from 900,000 to 1,500,000, which is comparable to that reported for similar resonators with moderate doping. The results indicate that the effect from heavy phosphorus doping on resonator stability or on silicon intrinsic losses is low at the studied doping levels.
Keywords
Q-factor; micromechanical resonators; phosphorus; semiconductor doping; silicon; vibrations; Lame mode resonators; P; Si; carrier concentration; degenerate doping; doping levels; electrostatically coupled tuning fork; heavy phosphorus doping; long term stability; n-type doped silicon resonators; quality factors; resonator stability; silicon intrinsic losses; time 220 day; width extensional mode resonators; Doping; Q-factor; Resonant frequency; Silicon; Temperature measurement; Temperature sensors; Thermal stability;
fLanguage
English
Publisher
ieee
Conference_Titel
Frequency Control Symposium (FCS), 2014 IEEE International
Conference_Location
Taipei
Type
conf
DOI
10.1109/FCS.2014.6859866
Filename
6859866
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