• DocumentCode
    1860670
  • Title

    Polarization and electron injection in silicon nitride induced by protons

  • Author

    Kliem, H. ; Homann, M.

  • Author_Institution
    AB Mater. der Mikroelektronik, Tech. Univ. Hamburg-Harburg, Germany
  • fYear
    1994
  • fDate
    23-26 Oct 1994
  • Firstpage
    767
  • Lastpage
    772
  • Abstract
    The Kohlrausch behaviour of the polarization currents j=At-α, which is found in many disordered insulators, has been detected in thin films of silicon nitride also. The material contains a small amount of hydrogen due to the growth process. Using a palladium electrode it was possible to incorporate additional hydrogen ions, i.e. protons. This results in an increase of A in the above formula by a factor 10. Furthermore it is found that electron injection is enhanced by the presence of additional protons
  • Keywords
    dielectric thin films; Kohlrausch law; Si3N4:H; disordered insulators; electron injection; hydrogen ions; palladium electrode; polarization currents; protons; silicon nitride; thin films; Distribution functions; Electrodes; Electrons; Hydrogen; Insulation; Palladium; Partial discharges; Polarization; Protons; Semiconductor thin films;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electrical Insulation and Dielectric Phenomena, 1994., IEEE 1994 Annual Report., Conference on
  • Conference_Location
    Arlington, TX
  • Print_ISBN
    0-7803-1950-8
  • Type

    conf

  • DOI
    10.1109/CEIDP.1994.592062
  • Filename
    592062