• DocumentCode
    1861890
  • Title

    Local extraction of base and thermal resistance of bipolar transistors

  • Author

    Setekera, Robert ; van der Toorn, Ramses ; Kloosterman, Willy

  • Author_Institution
    EEMCS, Delft Univ. of Technol., Delft, Netherlands
  • fYear
    2013
  • fDate
    Sept. 30 2013-Oct. 3 2013
  • Firstpage
    21
  • Lastpage
    24
  • Abstract
    We extend the category of parameter extraction methods that utilize weak avalanche under fixed emitter current conditions to extract base resistance. Our new method consistently accounts for self-heating and Early effect so as to arrive at an accurate extraction of both base and thermal resistance. It involves only small variations in bias and temperature conditions, so that parameter extraction as a function of bias and temperature is enabled. The method is directly applicable to transistors - no dedicated test structures are needed - so that the method is cost effective. The method is demonstrated on RF SiGe HBTs.
  • Keywords
    Ge-Si alloys; heterojunction bipolar transistors; thermal resistance; RF HBT; SiGe; base resistance; bias conditions; bipolar transistors; early effect; fixed emitter current conditions; local extraction; parameter extraction methods; self-heating; temperature conditions; thermal resistance; Current measurement; Digital video broadcasting; Integrated circuits; Temperature measurement; Thermal resistance; Voltage measurement; Early effect; avalanche multiplication; base resistance; bipolar transistor; self-heating; thermal resistance;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Bipolar/BiCMOS Circuits and Technology Meeting (BCTM), 2013 IEEE
  • Conference_Location
    Bordeaux
  • ISSN
    1088-9299
  • Print_ISBN
    978-1-4799-0126-5
  • Type

    conf

  • DOI
    10.1109/BCTM.2013.6798135
  • Filename
    6798135