DocumentCode
1861890
Title
Local extraction of base and thermal resistance of bipolar transistors
Author
Setekera, Robert ; van der Toorn, Ramses ; Kloosterman, Willy
Author_Institution
EEMCS, Delft Univ. of Technol., Delft, Netherlands
fYear
2013
fDate
Sept. 30 2013-Oct. 3 2013
Firstpage
21
Lastpage
24
Abstract
We extend the category of parameter extraction methods that utilize weak avalanche under fixed emitter current conditions to extract base resistance. Our new method consistently accounts for self-heating and Early effect so as to arrive at an accurate extraction of both base and thermal resistance. It involves only small variations in bias and temperature conditions, so that parameter extraction as a function of bias and temperature is enabled. The method is directly applicable to transistors - no dedicated test structures are needed - so that the method is cost effective. The method is demonstrated on RF SiGe HBTs.
Keywords
Ge-Si alloys; heterojunction bipolar transistors; thermal resistance; RF HBT; SiGe; base resistance; bias conditions; bipolar transistors; early effect; fixed emitter current conditions; local extraction; parameter extraction methods; self-heating; temperature conditions; thermal resistance; Current measurement; Digital video broadcasting; Integrated circuits; Temperature measurement; Thermal resistance; Voltage measurement; Early effect; avalanche multiplication; base resistance; bipolar transistor; self-heating; thermal resistance;
fLanguage
English
Publisher
ieee
Conference_Titel
Bipolar/BiCMOS Circuits and Technology Meeting (BCTM), 2013 IEEE
Conference_Location
Bordeaux
ISSN
1088-9299
Print_ISBN
978-1-4799-0126-5
Type
conf
DOI
10.1109/BCTM.2013.6798135
Filename
6798135
Link To Document