• DocumentCode
    1865164
  • Title

    Study of the ion-implanted back-surface fields in front-contact front-junction solar cells

  • Author

    Kim, Deok-kee ; Choi, Youngmoon ; Do, Eun Cheol ; Mun, Jinsoo ; Lee, Jin Wook ; Baik, Ihngee ; Kim, Dongkyun ; Kim, Yun Gi

  • Author_Institution
    Energy Lab., Samsung Adv. Inst. of Technol., Yongin, South Korea
  • fYear
    2011
  • fDate
    19-24 June 2011
  • Abstract
    We have studied low energy ion-implanted P+ and N+ back surface field (BSF) layers with shallow junctions in front-contact front-junction solar cells for the first time as far as we know. With N+ BSF layer, Voc and the efficiency of the solar cells increased on average by 30 mV and 1.3%, respectively. N+ BSF layer reduced recombination at the back surface significantly while P+ layer increased it. The higher Voc due to the reduced recombination for the N+ BSF and the lower Voc due to the increased recombination for the P+ BSF were attributed to the asymmetry in the capture cross-sections of the minority carriers (σn ~ 100*σp).
  • Keywords
    ion implantation; solar cells; front-contact front-junction solar cells; ion-implanted back-surface fields; low-energy ion-implanted BSF layers; recombination reduction; solar cell efficiency; Charge carrier processes; Doping; Photovoltaic cells; Radiative recombination; Silicon; Surface treatment;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Photovoltaic Specialists Conference (PVSC), 2011 37th IEEE
  • Conference_Location
    Seattle, WA
  • ISSN
    0160-8371
  • Print_ISBN
    978-1-4244-9966-3
  • Type

    conf

  • DOI
    10.1109/PVSC.2011.6186331
  • Filename
    6186331