DocumentCode
1866544
Title
Investigation of the current-voltage characteristics of N+/P junction silicon solar cell emitters formed by phosphorus diffusion paste on P-Si substrate
Author
Kim, JinSung ; Moon, Kyungwon ; Shin, Kyu-Sang ; Jung, Myeong-Il ; Choi, Chel-Jong
Author_Institution
Dept. of BIN Fusion Technol., Chonbuk Nat. Univ., Jeonju, South Korea
fYear
2011
fDate
19-24 June 2011
Abstract
We have investigated the current-voltage characteristics of n+/p junction solar cells formed on p-Si substrate with n+ emitter junction formed by diffusion phosphorus paste by means of furnace annealing. The annealing has been carried out in different ambients. The diode annealed in O2 ambient showed the best rectifying behavior while the diode annealed in Ar showed the least with degradation of rectifying behavior with increase of flow rate.
Keywords
annealing; elemental semiconductors; semiconductor diodes; silicon; solar cells; P-Si; Si; current-voltage characteristic investigation; diode annealing; flow rate increase; furnace annealing; n+ emitter junction; n+-p junction solar cell emitter; phosphorus diffusion paste; rectifying behavior; Annealing; Argon; Junctions; Photovoltaic cells; Semiconductor diodes; Silicon; Substrates;
fLanguage
English
Publisher
ieee
Conference_Titel
Photovoltaic Specialists Conference (PVSC), 2011 37th IEEE
Conference_Location
Seattle, WA
ISSN
0160-8371
Print_ISBN
978-1-4244-9966-3
Type
conf
DOI
10.1109/PVSC.2011.6186384
Filename
6186384
Link To Document