• DocumentCode
    1866824
  • Title

    Modeling of collisional effects in RF plasma sources

  • Author

    Bettenhausen, M.H. ; Scharer, J.E. ; Mouzouris, Y.

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Wisconsin Univ., Madison, WI, USA
  • fYear
    1997
  • fDate
    19-22 May 1997
  • Firstpage
    202
  • Abstract
    Summary form only given, as follows. Collisions are an important factor for power absorption in most radio-frequency (RF) plasma sources. Our chief interest in this work is the effect of collisional damping in helicon-type plasma sources. We consider sources with the frequency of operation on the order of 10 MHz and neutral background pressures ranging from a few mTorr to atmospheric. The characteristic collision frequency varies greatly over this pressure range. We consider three different regimes: /spl nu//spl Lt//spl omega/, /spl nu//spl ap//spl omega/ and /spl nu//spl Gt//spl omega/, where /spl nu/ is the characteristic collision frequency and /spl omega/ is the frequency of the RF source. We present results which show the differences of the radial power deposition for these three regimes using the ANTENA2 code, which employs a Krook-type model to calculate collisional damping. We discuss limitations of and possible improvements to this collision model. We also discuss the use of these results for improving the design of sources which will operate at neutral pressures.
  • Keywords
    modelling; plasma collision processes; plasma production; Krook-type model; RF plasma sources; characteristic collision frequency; collisional damping; collisional effects; helicon-type plasma sources; modeling; power absorption; radial power deposition; Computational modeling; Damping; Electromagnetic scattering; Electromagnetic wave absorption; Nuclear and plasma sciences; Plasma properties; Plasma simulation; Plasma sources; Plasma waves; Radio frequency;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 1997. IEEE Conference Record - Abstracts., 1997 IEEE International Conference on
  • Conference_Location
    San Diego, CA, USA
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-3990-8
  • Type

    conf

  • DOI
    10.1109/PLASMA.1997.604826
  • Filename
    604826