DocumentCode
1871009
Title
Patent protection in Y2K-virtual or real
Author
Kurland, L.G.
Author_Institution
245 Park Ave., New York, NY, USA
fYear
1999
fDate
28-28 May 1999
Firstpage
346
Abstract
Summary form only given, as follows. Many changes in the patent system and our approaches to it are occurring as we prepare for new technologies and rapid progress in the next millennium. Why this is happening and how to deal with it is explored at a basic level of understanding for both those with prior knowledge in this area as well as for neophytes as we learn from the past, wrestle with the present, and consider the future.
Keywords
copy protection; copyright; optics; optoelectronic devices; patents; Y2K; basic level of understanding; future; learn; neophytes; new technologies; next millennium; past; patent protection; patent system; present; prior knowledge; real; virtual; Cathodes; Electrodes; Fault location; Plasma density; Plasma diagnostics; Plasma sources; Plasma x-ray sources; Protection; X-ray imaging; X-ray lasers;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics, 1999. CLEO '99. Summaries of Papers Presented at the Conference on
Conference_Location
Baltimore, MD, USA
Print_ISBN
1-55752-595-1
Type
conf
DOI
10.1109/CLEO.1999.834285
Filename
834285
Link To Document