DocumentCode
18720
Title
Accurate characterization of SiO2 thin films using surface acoustic waves
Author
Knapp, Matthias ; Lomonosov, Alexey M. ; Warkentin, Paul ; Jager, Philipp M. ; Ruile, Werner ; Kirschner, Hans-Peter ; Honal, Matthias ; Bleyl, Ingo ; Mayer, Andreas P. ; Reindl, Leonhard M.
Author_Institution
a Group Co. of TDK Corp., EPCOS AG, Munich, Germany
Volume
62
Issue
4
fYear
2015
fDate
Apr-15
Firstpage
736
Lastpage
743
Abstract
We have investigated the acoustic properties of silicon dioxide thin films. Therefore, we determined the phase velocity dispersion of LiNbO3 substrate covered with SiO2 deposited by a plasma enhanced chemical vapor deposition and a physical vapor deposition (PVD) process using differential delay lines and laser ultrasonic method. The density p and the elastic constants (c11 and c44) can be extracted by fitting corresponding finite element simulations to the phase velocities within an accuracy of at least ±4%. Additionally, we propose two methods to improve the accuracy of the phase velocity determination by dealing with film thickness variation of the PVD process.
Keywords
elastic constants; finite element analysis; plasma CVD; silicon compounds; surface acoustic wave delay lines; surface acoustic waves; thin films; ultrasonic dispersion; ultrasonic velocity; LiNbO3; PVD; SiO2; acoustic properties; density; differential delay line; elastic constants; film thickness variation; finite element simulations; laser ultrasonic method; phase velocity dispersion; physical vapor deposition; plasma enhanced chemical vapor deposition; silicon dioxide thin films; surface acoustic waves; Accuracy; Acoustics; Delay lines; Films; Phase measurement; Substrates; Velocity measurement;
fLanguage
English
Journal_Title
Ultrasonics, Ferroelectrics, and Frequency Control, IEEE Transactions on
Publisher
ieee
ISSN
0885-3010
Type
jour
DOI
10.1109/TUFFC.2014.006921
Filename
7081469
Link To Document