Charging of substrates irradiated by particle beams

Summary form only given. Charging of a substrate due to irradiation of charged particle beams is a major problem in many applications of current interest, namely, ion implantation, etching, lithography, etc. In order to understand the underlying physical processes and identify the control parameters, a new approach is developed, both analytically and numerically, when the charged particle motion from the source is followed self-consistently and some simple considerations for beam-solid interactions are invoked. The problem is studied for three distinct irradiating species positive ions, negative ions and neutrals. The time history of the charging potential with the variation of the beam parameters, namely, beam current and beam voltage, is examined.