DocumentCode
1873312
Title
A novel in-situ lightpipe pyrometer calibration technique
Author
Hunter, Aaron ; Adams, Bruce ; Rubinchik, Alex ; Pham, Gia
Author_Institution
Appl. Mater. Inc., Santa Clara, CA, USA
fYear
2001
fDate
2001
Firstpage
169
Lastpage
172
Abstract
We present a novel method for calibrating lightpipe pyrometers in-situ, using an RTP chamber modified for that specific purpose. The chamber uses a wafer of high emissivity, which is further enhanced by a highly reflective, cool surface placed beneath it. We present data comparing consistency of traditional blackbody calibration of lightpipe pyrometers versus the same pyrometers undergoing the new method. We discuss the advantages of this calibration method over traditional blackbody calibration methods. We discuss practical methods for maintaining calibration consistency and repeatability. Finally, we discuss methods for consistent, accurate calibration of multiple pyrometers simultaneously.
Keywords
calibration; emissivity; optical sensors; pyrometers; rapid thermal processing; RTP chamber; blackbody calibration; calibration consistency; calibration repeatability; high emissivity wafer; highly reflective cool surface; in-situ calibration technique; lightpipe pyrometers; multiple pyrometers; Apertures; Calibration; Heat transfer; Impurities; Instruments; Mechanical factors; Optical scattering; Rapid thermal processing; Temperature control; Temperature measurement;
fLanguage
English
Publisher
ieee
Conference_Titel
Advanced Thermal Processing of Semiconductors 9th Internationa Conference on RTP 2001
Print_ISBN
0-9638251-0-4
Type
conf
DOI
10.1109/RTP.2001.1013762
Filename
1013762
Link To Document