DocumentCode
1874561
Title
Preparation and field emission properties of nanostructured CuO emitters
Author
Li, C.Y. ; Huang, J.X. ; Chen, Jun ; Deng, S.Z. ; Xu, N.S.
Author_Institution
State Key Lab. of Optoelectronic Mater. & Technol. & Guangdong Provice Key Lab. of Display Mater. & Technol., Zhongshan Univ., Guangzhou, China
fYear
2004
fDate
11-16 July 2004
Firstpage
128
Lastpage
129
Abstract
Field emission properties of semiconductor nanostructured CuO films synthesized by both solid-liquid and solid-gas reaction methods under different conditions have been studied and compared. The morphology and structure of the prepared nanostructures CuO films were characterized using scanning electron microscopy, transmission electron microscopy, and X-ray diffraction. Stable field emission at low field from CuO nanostructures has been obtained. The result indicates that nanostructured CuO could be a promising cold cathode material.
Keywords
X-ray diffraction; copper compounds; electron field emission; materials preparation; nanostructured materials; scanning electron microscopy; transmission electron microscopy; CuO; X-ray diffraction; cold cathode material; field emission properties; nanostructured CuO emitters; scanning electron microscopy; solid-gas reaction method; solid-liquid reaction method; transmission electron microscopy; Cathodes; Copper; Educational technology; Heating; Morphology; Nanostructured materials; Nanowires; Scanning electron microscopy; Substrates; Temperature;
fLanguage
English
Publisher
ieee
Conference_Titel
Vacuum Nanoelectronics Conference, 2004. IVNC 2004. Technical Digest of the 17th International
Print_ISBN
0-7803-8397-4
Type
conf
DOI
10.1109/IVNC.2004.1354933
Filename
1354933
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