• DocumentCode
    1878203
  • Title

    Integration of millisecond and spike anneals for dopant activation optimization

  • Author

    Shiyu Sun ; Sharma, Shantanu ; Rao, K.V. ; Ng, Bryan ; Kouzminov, D. ; Colombeau, B. ; Variam, N. ; Muthukrishnan, S. ; Mayur, A. ; Brand, A.

  • Author_Institution
    SSG CTO Office, Appl. Mater. Inc., Sunnyvale, CA, USA
  • fYear
    2013
  • fDate
    6-7 June 2013
  • Firstpage
    88
  • Lastpage
    90
  • Abstract
    The effects of anneal sequences (ms anneal followed by spike anneal vs. spike anneal followed by ms anneal) were explored. Substantial anneal sequence effects on dopant activation were also reported.
  • Keywords
    annealing; doping profiles; optimisation; secondary ion mass spectra; SIMS; dopant activation optimization; millisecond anneal; spike anneal; substantial anneal sequence effects; Annealing; Conferences; Implants; Junctions; Silicon; Temperature measurement;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Junction Technology (IWJT), 2013 13th International Workshop on
  • Conference_Location
    Kyoto
  • Print_ISBN
    978-1-4799-0578-2
  • Type

    conf

  • DOI
    10.1109/IWJT.2013.6644512
  • Filename
    6644512
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1878203