Monte Carlo simulation and experimental study of an electron cyclotron resonance plasma for thin film deposition

Author

Koretzky, E. ; Kuo, S.P. ; Kuo, S.C.

Author_Institution

Polytech. Univ., Farmingdale, NY, USA

fYear

1997

fDate

19-22 May 1997

Firstpage

231

Abstract

Summary form only given. Monte Carlo simulation of electron behavior in an ECR microwave discharge, maintained by the TM/sub 11/ mode of a cylindrical waveguide, has been performed. The results show that at low pressures (/spl sim/0.5 mtorr) the temperature of the tail portion of the EED exceeds 40 eV and the sheath potential is about -200 V. These results are about twice as high as the previous using the TM/sub 01/ mode. An ECR plasma source has been designed accordingly. A Langmuir probe is used to measure the characteristics of the plasma. Hydrogen mixed with 1% methane at a pressure of 0.5 mtorr is used as the background gas. The simulation and experimental results will be presented.

Keywords

Langmuir probes; Monte Carlo methods; circular waveguides; high-frequency discharges; plasma deposition; plasma temperature; thin films; -200 V; 0.5 mtorr; ECR microwave discharge; H/sub 2/-methane mixture; Langmuir probe; Monte Carlo simulation; TM/sub 11/ mode; cylindrical waveguide; electron behavior; electron cyclotron resonance plasma; sheath potential; temperature; thin film deposition; Electrons; Hydrogen; Plasma measurements; Plasma properties; Plasma sheaths; Plasma simulation; Plasma sources; Plasma temperature; Probes; Tail;

fLanguage

English

Publisher

ieee

Conference_Titel

Plasma Science, 1997. IEEE Conference Record - Abstracts., 1997 IEEE International Conference on

Conference_Location

San Diego, CA, USA

ISSN

0730-9244

Print_ISBN

0-7803-3990-8

Type

conf

DOI

10.1109/PLASMA.1997.604953

Filename

604953