Shape memory alloy thin film fabricated by laser ablation

Author

Ikuta, Koji ; Hayashi, Michihiro ; Matsuura, Toshihiko ; Fujishiro, Hiroyuki

Author_Institution

Dept. of Mech. Syst. Eng., Kyushu Inst. of Technol., Fukuoka, Japan

fYear

1994

fDate

1994

Firstpage

355

Lastpage

360

Abstract

New fabrication method using “Laser Ablation” was first applied to make SMA (TiNi alloy) thin film. TiNi thin film was obtained successfully and it showed one of the highest transformation temperature (351[k]) as SMA thin films. This transformation temperature was as high as conventional bulk TiNi alloy. Effectiveness and superiority to conventional process such as sputtering and vacuum vapor deposition was verified by several experiments in material science. It is considered that the most of advantages of the laser ablation of the TiNi thin film was caused by “ablation effect” in lower temperature rather than “thermal effect” during the process

Keywords

pulsed laser deposition; 351 K; TiNi; TiNi alloy thin film; laser ablation effect; micromechanical devices; shape memory alloy; thermal effect; transformation temperature; Chemical vapor deposition; Contamination; Laser ablation; Laser theory; Materials science and technology; Optical device fabrication; Shape memory alloys; Sputtering; Temperature; Transistors;

fLanguage

English

Publisher

ieee

Conference_Titel

Micro Electro Mechanical Systems, 1994, MEMS '94, Proceedings, IEEE Workshop on

Conference_Location

Oiso

Print_ISBN

0-7803-1833-1

Type

conf

DOI

10.1109/MEMSYS.1994.556166

Filename

556166