A new step motion of polysilicon microstructures

Author

Akiyama, Terunobu ; Shono, Katsufusa

Author_Institution

Dept. of Electr. & Electron. Eng., Sophia Univ., Tokyo, Japan

fYear

1993

fDate

7-10 Feb 1993

Firstpage

272

Lastpage

277

Abstract

Polysilicon sliders and rotors with a new step motion, which are fabricated on a silicon wafer by surface micromachine technology, are presented. The proportional relation between the velocity and the applied pulse frequency is experimentally confirmed. The coefficient in the relation is the step for an applied pulse, which is determined by the peak voltage of applied pulse, bushing height plate length, plate thickness etc

Keywords

electron beam lithography; elemental semiconductors; masks; micromechanical devices; rotors; silicon; small electric machines; sputter etching; stepping motors; Si; Si wafer; applied pulse frequency; bushing height plate length; electron beam direct writing; elemental semiconductor; five-mask process; peak voltage; plasma etching; plate thickness; polysilicon microstructures; rotors; sliders; step motion; surface micromachine; Fabrication; Frequency; Insulators; Microstructure; Rails; Shafts; Silicon; Thermal decomposition; Voltage; Writing;

fLanguage

English

Publisher

ieee

Conference_Titel

Micro Electro Mechanical Systems, 1993, MEMS '93, Proceedings An Investigation of Micro Structures, Sensors, Actuators, Machines and Systems. IEEE.

Conference_Location

Fort Lauderdale, FL

Print_ISBN

0-7803-0957-X

Type

conf

DOI

10.1109/MEMSYS.1993.296910

Filename

296910