DocumentCode
1901935
Title
Parylene-membrane piezoresistive pressure sensors with XeF2 -etched cavity
Author
Giacchino, Luca ; Tai, Yu-Chong
Author_Institution
Dept. of Electr. Eng., California Inst. of Technol., Pasadena, CA
fYear
2008
fDate
26-29 Oct. 2008
Firstpage
1568
Lastpage
1571
Abstract
Pressure sensors have been fabricated based on a deformable parylene C membrane over a cavity etched in silicon. The cavity is obtained by XeF2 etching, using a parylene mask composed of an array of holes. A subsequent parylene deposition fills the holes, thus sealing the cavity and completing the membrane. Gold piezoresistors are used to sense the membrane deformation. Compared to traditional pressure sensor designs, this process is more easily integrated into other processes, as no double-side machining or wet silicon etching is needed. The use of parylene is advantageous under certain points of view. First, it protects the piezoresistors and silicon, due to its well known barrier and chemical inertness properties. Second, contrary to other materials commonly used to fabricate pressure sensor membranes (e.g., polysilicon, silicon nitride), parylene is flexible, and thus more resistant to shocks. These two reasons make the sensor useful in chemically and physically harsh environments.
Keywords
etching; membranes; piezoresistive devices; pressure sensors; xenon compounds; cavity; etching; gold piezoresistors; membrane deformation; parylene mask; parylene-membrane piezoresistive pressure sensors; Biomembranes; Chemical sensors; Gold; Machining; Piezoresistance; Piezoresistive devices; Process design; Protection; Silicon; Wet etching;
fLanguage
English
Publisher
ieee
Conference_Titel
Sensors, 2008 IEEE
Conference_Location
Lecce
ISSN
1930-0395
Print_ISBN
978-1-4244-2580-8
Electronic_ISBN
1930-0395
Type
conf
DOI
10.1109/ICSENS.2008.4716748
Filename
4716748
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