• DocumentCode
    1901935
  • Title

    Parylene-membrane piezoresistive pressure sensors with XeF2-etched cavity

  • Author

    Giacchino, Luca ; Tai, Yu-Chong

  • Author_Institution
    Dept. of Electr. Eng., California Inst. of Technol., Pasadena, CA
  • fYear
    2008
  • fDate
    26-29 Oct. 2008
  • Firstpage
    1568
  • Lastpage
    1571
  • Abstract
    Pressure sensors have been fabricated based on a deformable parylene C membrane over a cavity etched in silicon. The cavity is obtained by XeF2 etching, using a parylene mask composed of an array of holes. A subsequent parylene deposition fills the holes, thus sealing the cavity and completing the membrane. Gold piezoresistors are used to sense the membrane deformation. Compared to traditional pressure sensor designs, this process is more easily integrated into other processes, as no double-side machining or wet silicon etching is needed. The use of parylene is advantageous under certain points of view. First, it protects the piezoresistors and silicon, due to its well known barrier and chemical inertness properties. Second, contrary to other materials commonly used to fabricate pressure sensor membranes (e.g., polysilicon, silicon nitride), parylene is flexible, and thus more resistant to shocks. These two reasons make the sensor useful in chemically and physically harsh environments.
  • Keywords
    etching; membranes; piezoresistive devices; pressure sensors; xenon compounds; cavity; etching; gold piezoresistors; membrane deformation; parylene mask; parylene-membrane piezoresistive pressure sensors; Biomembranes; Chemical sensors; Gold; Machining; Piezoresistance; Piezoresistive devices; Process design; Protection; Silicon; Wet etching;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Sensors, 2008 IEEE
  • Conference_Location
    Lecce
  • ISSN
    1930-0395
  • Print_ISBN
    978-1-4244-2580-8
  • Electronic_ISBN
    1930-0395
  • Type

    conf

  • DOI
    10.1109/ICSENS.2008.4716748
  • Filename
    4716748