DocumentCode
1902138
Title
Gate-capacitance extraction from RF C-V measurements [MOS device applications]
Author
Sasse, G.T. ; de Kort, R. ; Schmitz, J.
Author_Institution
MESA Res. Inst., Twente Univ., Enschede, Netherlands
fYear
2004
fDate
21-23 Sept. 2004
Firstpage
113
Lastpage
116
Abstract
In this work, a full two-port analysis of an RF C-V measurement set-up is given. This two-port analysis gives insight on the limitations of the commonly used gate capacitance extraction, based on the Y11 parameter of the device. It is shown that the parasitics of the device can disturb the extracted gate capacitance and a new extraction scheme, based on the Z-matrix, is introduced that eliminates the effect of these parasitics. Measurement results prove the validity of this new extraction scheme, under different conditions.
Keywords
MIS devices; capacitance measurement; impedance matrix; semiconductor device measurement; two-port networks; CMOS devices; RF C-V measurements; Z-matrix extraction scheme; device parasitics; gate-capacitance extraction; two-port analysis; Capacitance measurement; Capacitance-voltage characteristics; Current measurement; Electrical resistance measurement; Equivalent circuits; Frequency measurement; MOS capacitors; Parasitic capacitance; Radio frequency; Tunneling;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State Device Research conference, 2004. ESSDERC 2004. Proceeding of the 34th European
Print_ISBN
0-7803-8478-4
Type
conf
DOI
10.1109/ESSDER.2004.1356501
Filename
1356501
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