DocumentCode
1907390
Title
Double gates structure carbon nanotube field emission display
Author
Qilong Wang ; Wei Lei ; Baoping Wang ; Xiaobing Zhang ; Xuedong Zhou ; Min Liu
Author_Institution
Dept. of Electron. Eng., Southeast Univ., Nanjing, China
fYear
2003
fDate
7-11 July 2003
Firstpage
43
Lastpage
44
Abstract
A new structure of carbon nanotube field emission display has been studied. To shrink the range of the modulate voltage applied on the gate electrode, which is placed in the CNT/spl I.bar/FED, we have designed and fabricated one double gates structure. In the new structure, the one below, which is near to the CNT cathode, is made of metal mesh with MgO or MgF/sub 2/ layer, and the primary electrons that come from the cathode can excite the secondary electrons from the dielectric layer. The gate above the first one acts as the real modulate electrode in the new structure that can control the electrons, most of which are the secondary electrons. Because of the low energy of the secondary electrons, the range of the modulate voltage can be withdrawn. In order to find the best result, as to the modulate electrode made of metal mesh, we have the metal mesh covered with MgF/sub 2/ layer or not. The comparisons are shown in the paper. The simulation and the experiment data, which are given in the paper show we have got an effective method to reduce the expense of the driver circuit of the CNT/spl I.bar/FED.
Keywords
carbon nanotubes; cathodes; driver circuits; electrochemical electrodes; field emission displays; mesh generation; C; CNT FED; CNT cathode; dielectric layer; double gates structure carbon nanotube; driver circuit; field emission display; gate electrode; metal mesh; primary electrons; secondary electrons; Anodes; Carbon nanotubes; Cathodes; Dielectrics; Driver circuits; Electrodes; Electron emission; Flat panel displays; Liquid crystal displays; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Vacuum Microelectronics Conference, 2003. Technical Digest of the 16th International
Conference_Location
Osaka, Japan
Print_ISBN
4-8181-9515-4
Type
conf
DOI
10.1109/IVMC.2003.1222974
Filename
1222974
Link To Document