DocumentCode
1907527
Title
Rapid Thermal Processing and Thin Film Technologies
Author
Maex, Karen
Author_Institution
Interuniversity Microelectronics Center (IMEC v.z.w.), Kapeldreef 75, 3001 Leuven, Belgium
fYear
1991
fDate
16-19 Sept. 1991
Firstpage
467
Lastpage
474
Abstract
Over the last few years, there is an increasing interest in Rapid Thermal Processing for many applications in Si technology. Major issues like temperature control and uniformity as well as gas control have been improved. Moreover, with the introduction of single wafer cluster tools, rapid thermal processes become more important in various technological steps.
Keywords
Cleaning; Dielectric thin films; Microelectronics; Pollution measurement; Rapid thermal processing; Silicidation; Temperature control; Temperature measurement; Thermal engineering; Transistors;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid State Device Research Conference, 1991. ESSDERC '91. 21st European
Conference_Location
Montreux, Switzerland
Print_ISBN
0444890661
Type
conf
Filename
5435287
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