DocumentCode
1908736
Title
Passive and active probe arrays for dip-pen nanolithography
Author
Ming Zhang ; Bullen, D. ; Ryu, Kwang Sun ; Chang Liu
Author_Institution
Dept. of Electr. & Comput. Eng., Illinois Univ., Urbana, IL
fYear
2001
fDate
2001
Firstpage
27
Lastpage
31
Abstract
The development of passive and active atomic force microscope (AFM) probe arrays is reported in this paper. The devices are specifically designed to work with Dip-Pen Nanolithography and are fabricated using MEMS micromachining techniques. These devices can generate sub-100 nm patterns in a high speed, parallel, and controllable fashion
Keywords
atomic force microscopy; lithography; micromachining; nanotechnology; 100 nm; MEMS micromachining technique; active probe array; atomic force microscope; dip-pen nanolithography; passive probe array; Atomic force microscopy; Electron optics; High speed optical techniques; Lithography; Nanolithography; Optical sensors; Particle beam optics; Probes; Throughput; Ultraviolet sources;
fLanguage
English
Publisher
ieee
Conference_Titel
Nanotechnology, 2001. IEEE-NANO 2001. Proceedings of the 2001 1st IEEE Conference on
Conference_Location
Maui, HI
Print_ISBN
0-7803-7215-8
Type
conf
DOI
10.1109/NANO.2001.966387
Filename
966387
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