DocumentCode

1909174

Title

An Improved Technology for Elevated Source/Drain MOSFETS

Author

Waite, A.M. ; Howard, D.J. ; Kubicek, S. ; Caymax, M. ; De Meyer, K. ; Evans, A.G.R.

Author_Institution

University of Southampton, UK

fYear

1997

fDate

22-24 September 1997

Firstpage

256

Lastpage

259

Keywords

CMOS process; CMOS technology; Dry etching; Epitaxial growth; Implants; MOSFETs; Manufacturing processes; Silicon; Space technology; Thermal resistance;

fLanguage

English

Publisher

ieee

Conference_Titel

Solid-State Device Research Conference, 1997. Proceeding of the 27th European

Print_ISBN

2-86332-221-4

Type

conf

DOI

10.1109/ESSDERC.1997.194414

Filename

1503344