Optimisation of Ultra High Density MOS Arrays in 3Ds

Author

Haneder, T. ; Bertagnolli, E. ; Philipsborn, H.v. ; Krautschneider, W. ; Hofmann, F. ; Willer, J. ; Boehm, T.

Author_Institution

University of Regensburg, Germany

fYear

1997

fDate

22-24 September 1997

Firstpage

268

Lastpage

271

Keywords

Annealing; Boron; Costs; Etching; Isolation technology; MOSFET circuits; Semiconductor memory; Silicon; Substrates; Threshold voltage;

fLanguage

English

Publisher

ieee

Conference_Titel

Solid-State Device Research Conference, 1997. Proceeding of the 27th European

Print_ISBN

2-86332-221-4

Type

DOI

10.1109/ESSDERC.1997.194417

Filename

1503347

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