DocumentCode

1910136

Title

Low-Cost CMOS Process with Complete Post-Gate Implantation Scheme

Author

Kerber, M. ; Schwalke, U. ; Heinrich, R.

Author_Institution

Siemens AG, Germany

fYear

1997

fDate

22-24 September 1997

Firstpage

400

Lastpage

403

Keywords

CMOS process; CMOS technology; Costs; Doping profiles; Fabrication; Implants; MOS devices; MOSFETs; Optimized production technology; Oxidation;

fLanguage

English

Publisher

ieee

Conference_Titel

Solid-State Device Research Conference, 1997. Proceeding of the 27th European

Print_ISBN

2-86332-221-4

Type

conf

DOI

10.1109/ESSDERC.1997.194450

Filename

1503380