DocumentCode
1911093
Title
Porous silicon as multifunctional material in MEMS
Author
Mescheder, U.M. ; Kovacs, A. ; Kronast, W. ; Barsony, I. ; Adam, M. ; Ducso, Cs.
Author_Institution
Univ. of Appl. Sci., Furtwangen, Germany
fYear
2001
fDate
2001
Firstpage
483
Lastpage
488
Abstract
Porous Si with pore size in the range of a few nanometers can be used as multifunctional material in different MEMS applications. In this paper, we first discuss the fabrication and characterization of porous Si. Porous Si has been used as sacrificial layer for the realization of micro-heaters, micro-hotplates and microphones. A new type of surface micromachining process for the fabrication of sub-μm freestanding crystalline structures is presented. The use of porous Si as functional layer for different types of microsystems is discussed
Keywords
anodisation; elemental semiconductors; heating elements; membranes; micromachining; micromechanical devices; micromechanical resonators; microphones; microsensors; porous semiconductors; silicon; MEMS; MEMS applications; Si; Si pore size; anodisation process; freestanding crystalline structures; micro-heaters; micro-hotplates; microphones; microsystems; multifunctional material; porous Si; porous Si characterization; porous Si fabrication; porous Si functional layer; porous Si sacrificial layer; porous silicon; surface micromachining process; Conducting materials; Crystalline materials; Crystallization; Current density; Fabrication; Material properties; Micromechanical devices; Nanobioscience; Optical filters; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
Nanotechnology, 2001. IEEE-NANO 2001. Proceedings of the 2001 1st IEEE Conference on
Conference_Location
Maui, HI
Print_ISBN
0-7803-7215-8
Type
conf
DOI
10.1109/NANO.2001.966471
Filename
966471
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