• DocumentCode
    1911218
  • Title

    Electro-mechanical properties of single crystal silicon nano wire

  • Author

    Toriyama, Toshiyuki ; Funai, Daisuke ; Sugiyama, Susumu

  • Author_Institution
    New Energy & Ind. Technol. Dev. Organ., Tokyo, Japan
  • fYear
    2001
  • fDate
    2001
  • Firstpage
    516
  • Lastpage
    521
  • Abstract
    A p-type Si nano wire piezoresistor, whose minimum cross sectional area is 53nm × 53nm, was fabricated by combination of thermal diffusion, electron beam (EB) direct writing and RIE. Maximum value of longitudinal piezoresistance coefficient πl[011] of the Si nano wire piezoresistor is found to be 48 × 10-5 (1/MPa) at impurity concentration of 5 × 1019 (cm-3), and it has enough sensitivity for mechanical sensor application. Longitudinal piezoresistance coefficient πl[011] of the Si nano wire piezoresistor enhanced up to 46% with a decrease in the cross sectional area, while transverse piezoresistance coefficient πl[011] decreased with a decrease in the cross sectional area. An extremely small piezoresistive cantilever for SPM has been proposed by using the nano wire piezoresistor. The proposed piezoresistive cantilever has relatively high sensitivity, and possibility to replace with the optical technique in SPM
  • Keywords
    elemental semiconductors; microsensors; nanotechnology; piezoresistive devices; resistors; scanning probe microscopy; silicon; sputter etching; thermal diffusion; 53 nm; MEMS; RIE; SPM; Si; electromechanical properties; electron beam direct writing; longitudinal piezoresistance coefficient; mechanical sensor application; p-Si piezoresistor; piezoresistive cantilever; reactive ion etching; scanning probe microscopy; single crystal Si nano wire; thermal diffusion; transverse piezoresistance coefficient; Electron beams; Impurities; Mechanical sensors; Optical sensors; Piezoresistance; Scanning probe microscopy; Silicon; Ultraviolet sources; Wire; Writing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nanotechnology, 2001. IEEE-NANO 2001. Proceedings of the 2001 1st IEEE Conference on
  • Conference_Location
    Maui, HI
  • Print_ISBN
    0-7803-7215-8
  • Type

    conf

  • DOI
    10.1109/NANO.2001.966477
  • Filename
    966477