EPIS (equipment and process information system) a new prospect of EDA and SPC system

EDA and SPC system technique had been widely used in semiconductor manufacturing industry for a long time. Those techniques can provide a statistical view of process control and a powerful tool for process improvement. However, it becomes more difficult to sustain the EDA and SPC system after the implementation of FAB automation due to the complication of the processes and the huge volume of data associated with it. Foundry fabs need to adapt to different processes and devices which made the job even more difficult. It is almost impossible for the engineer to analyze the huge amount of EDA and SPC data without a good tool. EPIS provides an effective tool for engineers to query, screen, correlate and analyze their SPC or EDA data, which will help the engineer to maintain process stability and troubleshooting