Equipment efficiency improvement: the new frontier

Author

Leachman, Robert C. ; Busing, David P. ; Liu, Tmg-Yun ; Moore, David

Author_Institution

California Univ., Berkeley, CA, USA

fYear

1997

fDate

6-8 Oct 1997

Abstract

It has been determined from the Competitive Semiconductor Manufacturing (CSM) Survey that equipment throughput performance is highly divergent among competing fabs, and that even among leaders, there seems to be significant improvement potential. This paper first presents a summary of new research being done at the University of California at Berkeley to measure and monitor OEE and productivity losses. A summary of best practices from the CSM survey is then presented

Keywords

cluster tools; critical path analysis; electronics industry; integrated circuit yield; process control; production control; semiconductor process modelling; OEE; best practices; cluster tools; competitive semiconductor manufacturing survey; equipment efficiency improvement; equipment throughput performance; factory scheduling; idle time; improvement potential; machine availability; on-line efficiency monitoring; process control; production planning; productivity losses; recipe overload; Best practices; Distortion measurement; Lead; Loss measurement; Monitoring; Productivity; Semiconductor device manufacture; Semiconductor process modeling; Throughput; Time measurement;

fLanguage

English

Publisher

ieee

Conference_Titel

Semiconductor Manufacturing Conference Proceedings, 1997 IEEE International Symposium on

Conference_Location

San Francisco, CA

Print_ISBN

0-7803-3752-2

Type

conf

DOI

10.1109/ISSM.1997.664617

Filename

664617