• DocumentCode
    1912805
  • Title

    The New Limits of Optical Lithography

  • Author

    Arnold, W.H.

  • Author_Institution
    Integrated Technol. Div., Adv. Micro Devices, Sunnyvale, CA, USA
  • fYear
    1993
  • fDate
    13-16 Sept. 1993
  • Firstpage
    233
  • Lastpage
    237
  • Abstract
    This paper outlines the broad concepts of phase shifted mask technology, off-axis illumination, and pupil-plane filtering for high resolution optical lithography and forecasts the impact these will have on 0.35 and 0.25 micron device fabrication. The limits of these technologies are assessed.
  • Keywords
    masks; nanofabrication; photolithography; device fabrication; off-axis illumination; optical lithography; phase shifted mask technology; pupil-plane filtering; size 0.25 micron; size 0.35 micron; Apertures; Integrated optics; Interference; Lighting; Lithography; Optical attenuators; Optical device fabrication; Optical devices; Optical films; Optical filters;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid State Device Research Conference, 1993. ESSDERC '93. 23rd European
  • Conference_Location
    Grenoble
  • Print_ISBN
    2863321358
  • Type

    conf

  • Filename
    5435498
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1912805