• DocumentCode
    1919913
  • Title

    P1.4: Field effect controlled lateral field emission triode

  • Author

    Palma, John F. ; Mil´Shtein, Samson

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Univ. of Massachusetts, Lowell, MA, USA
  • fYear
    2010
  • fDate
    26-30 July 2010
  • Firstpage
    36
  • Lastpage
    37
  • Abstract
    Lateral field emission transistors show promise for many high frequency and high power applications. Typical lateral devices place a gate roughly in between the cathode tip and the anode. While effective, such devices require large gate voltages for device control. This study proposes relocating the gate to on top of the semiconductor cathode stem, behind its emitting tip, allowing field effect control of the transistor. Both enhancement and depletion mode are possible, and the gate bias range needed for control becomes an easily designed parameter. Example structures are modeled where this range is about a volt. Relocation of the gate has the additional benefit of simplifying the region between the anode and cathode tip, thus opening up the possibility of shrinking their spacing.
  • Keywords
    electron field emission; field effect transistors; triodes; vacuum microelectronics; depletion mode; emitting tip; enhancement mode; field effect controlled lateral field emission triode; lateral field emission transistors; semiconductor cathode stem; vacuum microelectronics; Anodes; Cathodes; Doping; FETs; Logic gates; Semiconductor diodes; FETs; electron emission; field emission; vacuum microelectronics;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Vacuum Nanoelectronics Conference (IVNC), 2010 23rd International
  • Conference_Location
    Palo Alto, CA
  • Print_ISBN
    978-1-4244-7889-7
  • Electronic_ISBN
    978-1-4244-7888-0
  • Type

    conf

  • DOI
    10.1109/IVNC.2010.5563165
  • Filename
    5563165