• DocumentCode
    1921590
  • Title

    Enhanced Intrinsic Gain (gm/gd) of PMOSFETs with a Si

  • Author

    Lindgren, A.C. ; Hellberg, P.E. ; von Haartman, M. ; Wu, D. ; Menon, C. ; Zhang, S.L. ; Östling, M.

  • Author_Institution
    Royal Institute of Technology, Kista, Sweden
  • fYear
    2002
  • fDate
    24-26 September 2002
  • Firstpage
    175
  • Lastpage
    178
  • Keywords
    Annealing; Degradation; Epitaxial layers; Germanium silicon alloys; Information technology; MOSFETs; Microelectronics; Silicon germanium; Transconductance; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State Device Research Conference, 2002. Proceeding of the 32nd European
  • Print_ISBN
    88-900847-8-2
  • Type

    conf

  • DOI
    10.1109/ESSDERC.2002.194898
  • Filename
    1503828