Design of a large-scale plasma source ion implantation experiment

Summary form only given. The authors present the design of a large-scale plasma source ion implantation experiment recently assembled at Los Alamos, in which one has begun implanting targets with surface areas of 102 m/sup 2/ in a 1.5 m-diameter, 4.6 m-length cylindrical vacuum chamber, using pulse modulator technology capable of supplying 60 A peak and 2.4 A average current at up to 120 kV. Implant targets up to 7.5 tons can be accommodated in the vacuum chamber. Measurements have been made of the plasma density and uniformity produced by a 13.56 MHz capacitively-coupled source with a variety of antenna configurations, with and without a magnetic field. Measurements of sheath expansion and implant current have been compared with analytic models and particle-in-cell simulations. The effect of secondary electron emission and target sputtering was modeled, and the X-ray flux produced when secondary electrons are accelerated and hit the vacuum chamber wall were calculated.