DocumentCode
1922597
Title
On Increasing the Accuracy of Simulations of Deposition and Etching Processes Using Radiosity and the Level Set Method
Author
Heitzinger, Clemens ; Fugger, Josef ; Haberlen, Oliver ; Selberherr, Siegfried
Author_Institution
Institute for Microelectronics, Vienna, Austria
fYear
2002
fDate
24-26 September 2002
Firstpage
347
Lastpage
350
Keywords
Computational modeling; Etching; Level set; Manufacturing processes; Predictive models; Rough surfaces; Semiconductor device manufacture; Silicon; Surface roughness; Surface topography;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State Device Research Conference, 2002. Proceeding of the 32nd European
Print_ISBN
88-900847-8-2
Type
conf
DOI
10.1109/ESSDERC.2002.194940
Filename
1503870
Link To Document