Observation of sheath characteristics on a sample undergoing plasma ion implantation

Summary form only given. A microwave isolator and a new tuner have been added to the UTK Microwave Plasma Facility (MPF). Plasma ion implantation (PII) is accomplished by pulsed biasing of the sample to negative potentials greater than 15 kV, which accelerates ions and implants them to depths which provide beneficial effects for wear and corrosion resistance. Obtaining the best results from PII requires that the sheath between the plasma and sample be smaller than the characteristic radius of curvature of the sample surface. The authors have investigated the visual appearance of the sheath observed in the MPF plasma as well as the electron number density and kinetic temperature of the ambient plasma. Also studied were the effects of longer periods between implantation pulses for PII, and the effect of varying the operating gas pressure.