DocumentCode
1926683
Title
Next generation substrate for high density and thin package
Author
Furuta, Toru
Author_Institution
IBIDEN Co., Ltd., Ogaki, Japan
fYear
2010
fDate
24-26 Aug. 2010
Firstpage
1
Lastpage
4
Abstract
Advancements and reduced geometries in Si development have significantly impacted package substrate technology. In particular, the reduced die size and consumer applications now require higher routing densities, smaller assembly area and an overall thinner profile for package substrates. In support of the high density requirements and general miniaturization trend, a number of packaging solutions have been adopted, including: migration to FC interconnection, and three dimensional packaging structures such as MCP (multi chip package) and POP (package on package). Along with high routing density, thin package reliability requirements remain high and also pose new challenges. Particularly, three dimensional packaging solutions have reduced the threshold for reliability factors such as drop test and warpage. To support these reliability challenges, new surface treatment and substrate material options have been explored. In support of the above mentioned high density and reliability requirements, IBIDEN proposes the FVC (filled via core) substrate structure.
Keywords
integrated circuit packaging; integrated circuit reliability; substrates; surface treatment; IBIDEN; drop test; filled via core substrate structure; high density package; next generation substrate; package substrate technology; substrate material; surface treatment; thin package reliability; warpage; Copper; Gold; Nickel; Substrates; Surface finishing;
fLanguage
English
Publisher
ieee
Conference_Titel
CPMT Symposium Japan, 2010 IEEE
Conference_Location
Tokyo
Print_ISBN
978-1-4244-7593-3
Type
conf
DOI
10.1109/CPMTSYMPJ.2010.5679661
Filename
5679661
Link To Document