• DocumentCode
    1926683
  • Title

    Next generation substrate for high density and thin package

  • Author

    Furuta, Toru

  • Author_Institution
    IBIDEN Co., Ltd., Ogaki, Japan
  • fYear
    2010
  • fDate
    24-26 Aug. 2010
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    Advancements and reduced geometries in Si development have significantly impacted package substrate technology. In particular, the reduced die size and consumer applications now require higher routing densities, smaller assembly area and an overall thinner profile for package substrates. In support of the high density requirements and general miniaturization trend, a number of packaging solutions have been adopted, including: migration to FC interconnection, and three dimensional packaging structures such as MCP (multi chip package) and POP (package on package). Along with high routing density, thin package reliability requirements remain high and also pose new challenges. Particularly, three dimensional packaging solutions have reduced the threshold for reliability factors such as drop test and warpage. To support these reliability challenges, new surface treatment and substrate material options have been explored. In support of the above mentioned high density and reliability requirements, IBIDEN proposes the FVC (filled via core) substrate structure.
  • Keywords
    integrated circuit packaging; integrated circuit reliability; substrates; surface treatment; IBIDEN; drop test; filled via core substrate structure; high density package; next generation substrate; package substrate technology; substrate material; surface treatment; thin package reliability; warpage; Copper; Gold; Nickel; Substrates; Surface finishing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    CPMT Symposium Japan, 2010 IEEE
  • Conference_Location
    Tokyo
  • Print_ISBN
    978-1-4244-7593-3
  • Type

    conf

  • DOI
    10.1109/CPMTSYMPJ.2010.5679661
  • Filename
    5679661