MSW resonators on silicon bulk and on micromachined silicon membrane: a comparison

Author

Sajin, George ; Marcelli, Romolo ; Cismaru, Alina

Author_Institution

Nat. Res. & Dev. Inst. for Microtechnologies, Bucharest, Romania

Volume

1

fYear

2001

fDate

2001

Firstpage

155

Abstract

A frequency tunable MSW resonator made by a YIG film has been used as a selective frequency component in a micromachined resonating filter. S-parameters have been measured at different DC magnetic bias fields, with a frequency tunability between 2 GHz and 7.5 GHz. An improvement of the performances for the SERs excited by micromachined microstrip transducers has been clearly demonstrated. Moreover, the utilization of silicon membranes to support MSW-SERs offers important openings toward the integration of magnetostatic wave devices with micromachined structures

Keywords

S-parameters; magnetic microwave devices; magnetostatic wave devices; membranes; micromechanical resonators; microstrip resonators; microwave filters; passive filters; resonator filters; silicon; tuning; yttrium compounds; 2 to 7.5 GHz; DC magnetic bias fields; S-parameters; SHF; Si; Si bulk; YFe5O12; YIG; YIG film; bulk MSW resonators; frequency tunable MSW resonator; magnetostatic wave devices; micromachined Si membranes; micromachined microstrip transducers; micromachined resonating filter; selective frequency component; Frequency measurement; Magnetic field measurement; Magnetic films; Magnetic separation; Magnetostatic waves; Microstrip; Resonant frequency; Resonator filters; Scattering parameters; Silicon;

fLanguage

English

Publisher

ieee

Conference_Titel

Semiconductor Conference, 2001. CAS 2001 Proceedings. International

Conference_Location

Sinaia

Print_ISBN

0-7803-6666-2

Type

conf

DOI

10.1109/SMICND.2001.967435

Filename

967435