• DocumentCode
    1934426
  • Title

    Monte Carlo simulation of electron behavior in an electron cyclotron resonance microwave discharge

  • Author

    Kuo ; Kunhardt, Erich E. ; Kuo, Spencer P.

  • Author_Institution
    Weber Res. Inst., Polytech. Univ., Farmingdale, NY, USA
  • fYear
    1993
  • fDate
    7-9 June 1993
  • Firstpage
    139
  • Abstract
    Summary form only given. Electron behavior in an electron cyclotron resonance microwave discharge maintained by the TM/sub 01/ mode fields of a cylindrical waveguide has been investigated via a Monte Carlo simulation. Since this discharge has a high degree of ionization (> 1%), a self-consistent simulation of the plasma dynamics is performed using the ponderomotive and Grad-B (-/spl muspl utrisub /spl parB) forces. Accumulation of negative charges on the boundary surface sets up a sheath whose influence is also taken into account. The time averaged, spatially dependent electron energy distribution is computed self-consistently by integrating electron trajectories subject to microwave fields, the divergent background magnetic field, the space charge field, and the sheath field, taking into account electron-electron collisions and collisions with the neutral hydrogen atoms. At low pressures (approximately 0.5 mTorr), the sheath potential is the order of 100 V and decreases with increasing pressure. This observation suggests a pressure range for operation of reactors for diamond-like carbon film deposition.
  • Keywords
    Monte Carlo methods; 0.5 mtorr; 100 V; ECR; Monte Carlo simulation; TM/sub 01/ mode fields; boundary surface; cylindrical waveguide; divergent background magnetic field; electron behavior; electron cyclotron resonance; electron trajectories; electron-electron collisions; low pressures; microwave discharge; microwave fields; plasma dynamics; ponderomotive forces; self-consistent simulation; sheath field; sheath potential; space charge field; spatially dependent electron energy distribution; Computational modeling; Cyclotrons; Distributed computing; Electrons; Ionization; Plasma sheaths; Plasma simulation; Plasma waves; Resonance; Surface discharges;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 1993. IEEE Conference Record - Abstracts., 1993 IEEE International Conference on
  • Conference_Location
    Vancouver, BC, Canada
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-1360-7
  • Type

    conf

  • DOI
    10.1109/PLASMA.1993.593406
  • Filename
    593406