• DocumentCode
    1939462
  • Title

    Microdevice for Continuous Isolation of Plasma from Whole Blood

  • Author

    Chen, Xing ; Cui, Dafu ; Zhang, Lulu

  • Author_Institution
    State Key Lab. of Transducer Technol., Chinese Acad. of Sci., Beijing
  • Volume
    2
  • fYear
    2008
  • fDate
    27-30 May 2008
  • Firstpage
    644
  • Lastpage
    647
  • Abstract
    In this manuscript we designed, fabricated, and tested a novel microfluidic device for continuous and real time separation of plasma from whole blood based on plasma skimming effect and microcentrifugal effect using microchannels and micro structures. The microdevice was fabricated by micro electro mechanical system (MEMS) technology, which was made of a silicon wafer with a single step of deep reaction ion etching and a PDMS-glass cover. The process of plasma separation was implemented continuously without problems of clogging or jamming. The plasma selectivity of 95.36% % is obtained under the optimal conditions. This microdevice has the potential to integrate into micro total analytical system (muTAS) with the advantages of low cost, short analytical time, disposability, low reagent and sample consumption, which will create a microanalysis system for point-of-care diagnostics.
  • Keywords
    bioMEMS; blood; microfluidics; silicon; MEMS technology; PDMS glass cover; Si; blood plasma isolation; deep reaction ion etching; micro electro mechanical system technology; micro total analytical system; microcentrifugal effect; microchannels; microdevice; microfluidic device; plasma selectivity; plasma skimming effect; silicon wafer; Blood; Etching; Mechanical systems; Microchannel; Microfluidics; Micromechanical devices; Plasma applications; Plasma devices; Silicon; Testing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    BioMedical Engineering and Informatics, 2008. BMEI 2008. International Conference on
  • Conference_Location
    Sanya
  • Print_ISBN
    978-0-7695-3118-2
  • Type

    conf

  • DOI
    10.1109/BMEI.2008.119
  • Filename
    4549253