DocumentCode
1943635
Title
p-type modulation carbon-doping to InGaAs/AlGaAs quantum wells by MOCVD auto-doping for surface-emitting lasers
Author
Hatori, N. ; Mizutani, A. ; Nishiyama, N. ; Koyama, F. ; Iga, K.
Author_Institution
Precision & Intelligence Lab., Tokyo Inst. of Technol., Yokohama, Japan
fYear
1997
fDate
11-13 Aug. 1997
Firstpage
39
Lastpage
40
Abstract
We have proposed a novel structure of p-type modulation doped QWs using a carbon auto doping method, and demonstrated carbon auto doping into AlAs layers by LP-MOCVD. We grew p-type modulation doped InGaAs/AlGaAs QWs, and fabricated edge emitting lasers using the QWs and achieved the reduction of the threshold current density for the first time. We estimated threshold current density (160 A/cm/sup 2/ for 1/spl times/10/sup 19/ cm/sup -3/ modulation doped three QWs edge emitting lasers), and showed the threshold reduction compared with undoped and n-type modulation QW VCSELs. The obtained result shows that the p-type modulation doping could improve the laser performance in terms of reduction of turn-on delay time, resulting in the possibility of future parallel optical transmission systems.
Keywords
III-V semiconductors; aluminium compounds; carbon; current density; gallium arsenide; hole density; indium compounds; quantum well lasers; semiconductor doping; semiconductor growth; surface emitting lasers; vapour phase epitaxial growth; AlAs:C; C auto doping method; InGaAs-AlGaAs; InGaAs/AlGaAs quantum wells; LP-MOCVD; MOCVD auto-doping; edge emitting lasers; p-type modulation carbon-doping; parallel optical transmission systems; surface-emitting lasers; three QWs edge emitting lasers; threshold current density; turn-on delay time; Carbon dioxide; Delay effects; Doping; Epitaxial layers; Indium gallium arsenide; Optical modulation; Quantum well lasers; Stimulated emission; Threshold current; Vertical cavity surface emitting lasers;
fLanguage
English
Publisher
ieee
Conference_Titel
Vertical-Cavity Lasers, Technologies for a Global Information Infrastructure, WDM Components Technology, Advanced Semiconductor Lasers and Applications, Gallium Nitride Materials, Processing, and Devi
Conference_Location
Montreal, Que., Canada
Print_ISBN
0-7803-3891-X
Type
conf
DOI
10.1109/LEOSST.1997.619095
Filename
619095
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