DocumentCode
1949195
Title
50μm pitch Pb-free micro-bumps by C4NP technology
Author
Dang, Bing ; Shih, Da-Yuan ; Buchwalter, Stephen ; Tsang, Cornelia ; Patel, Chirag ; Knickerbocker, John ; Gruber, Peter ; Knickerbocker, Sarah ; Garant, John ; Semkow, Krystyna ; Ruhmer, Klaus ; Hughlett, Emmett
Author_Institution
IBM T. J. Watson Res. Center, Yorktown Heights, NY
fYear
2008
fDate
27-30 May 2008
Firstpage
1505
Lastpage
1510
Abstract
Controlled collapse chip connection new process (C4NP) is currently used in IBM manufacturing for all 300 mm Pb-free wafer bumping for flip chip packages. In this study, the extendibility of C4NP technology to ultra fine pitch applications has been explored. Reusable C4NP glass molds were fabricated and characterized for 50 mum pitch application. Mold fill and wafer transfer with Pb-free solders have been demonstrated using both 200 mm and 300 mm wafers in a manufacturing environment. Significant improvement in bump yield was achieved for these early demonstrations of fine pitch interconnections through process optimization and contamination control. Challenge in wafer inspection metrology is discussed for the 50 mum pitch micro-bumps. Mechanical strength of the C4NP micro-bumps has been characterized using test dies with a full area array of micro-bumps.
Keywords
flip-chip devices; integrated circuit interconnections; mechanical strength; moulding; wafer level packaging; C4NP technology; bump yield; controlled collapse chip connection new process; fine pitch interconnection; flip chip package; mechanical strength; mold fill; pitch microbump; reusable glass mold; size 50 mum; wafer inspection metrology; wafer transfer; Chemical technology; Contamination; Costs; Glass; Inspection; Manufacturing processes; Packaging; Production; Sputter etching; Testing;
fLanguage
English
Publisher
ieee
Conference_Titel
Electronic Components and Technology Conference, 2008. ECTC 2008. 58th
Conference_Location
Lake Buena Vista, FL
ISSN
0569-5503
Print_ISBN
978-1-4244-2230-2
Electronic_ISBN
0569-5503
Type
conf
DOI
10.1109/ECTC.2008.4550175
Filename
4550175
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