• DocumentCode
    1955946
  • Title

    Photon emission from 70 nm gate length MOSFETs

  • Author

    Kurino, H. ; Hashimoto, H. ; Hiruma, Y. ; Fujimori, T. ; Koyanagi, M.

  • Author_Institution
    Res. Center for Integrated Syst., Hiroshima Univ., Japan
  • fYear
    1992
  • fDate
    13-16 Dec. 1992
  • Firstpage
    1015
  • Lastpage
    1018
  • Abstract
    The photon emission from extremely small size MOSFETs with L/sub G/=70 nm is observed for the first time. It is found that the electron temperature of the hot electrons monotonously increases while the substrate current to drain current ratio which is related to the avalanche multiplication factor initially increases and then decreases due to the latch effect caused by the parasitic bipolar transistor action as the gate length is reduced from 500 nm to 70 nm. The number of photons emitted with a higher energy has more intimate relation with the charge pumping current change caused by the hot-carrier generated interface states. It is shown that the photon emission is more effective for evaluating the hot carrier phenomenon than the substrate current when the gate length is smaller and the drain voltage is higher.<>
  • Keywords
    hot carriers; impact ionisation; insulated gate field effect transistors; interface electron states; 70 nm; avalanche multiplication factor; charge pumping current change; electron temperature; gate length; hot electrons; interface states; latch effect; parasitic bipolar transistor action; photon emission; small size MOSFETs; substrate current to drain current ratio; Hot carriers; Impact ionization; Insulated gate FETs; Interface phenomena;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1992. IEDM '92. Technical Digest., International
  • Conference_Location
    San Francisco, CA, USA
  • ISSN
    0163-1918
  • Print_ISBN
    0-7803-0817-4
  • Type

    conf

  • DOI
    10.1109/IEDM.1992.307533
  • Filename
    307533