• DocumentCode
    1956915
  • Title

    Hydrogen plasma treatment for Si waveguide smoothing

  • Author

    Cai, Jingnan ; Wang, Yu ; Ishikawa, Yasuhiko ; Yamashita, Yoshifumi ; Kamiura, Yoichi ; Wada, Kazumi

  • Author_Institution
    Dept. of Mater. Eng., Univ. of Tokyo, Tokyo, Japan
  • fYear
    2011
  • fDate
    14-16 Sept. 2011
  • Firstpage
    95
  • Lastpage
    97
  • Abstract
    We demonstrated that remote hydrogen plasma treatment on silicon ring resonators can smooth the Si waveguides at lower than 100°C. This also provides a promising way to trim resonators for a designed add/drop wavelength.
  • Keywords
    elemental semiconductors; hydrogen; optical resonators; optical waveguides; plasma materials processing; silicon; Si; Si waveguide smoothing; add/drop wavelength; remote hydrogen plasma treatment; silicon ring resonators; trim resonators; Educational institutions; Optical ring resonators; Optical waveguides; Plasmas; Refractive index; Scanning electron microscopy; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Group IV Photonics (GFP), 2011 8th IEEE International Conference on
  • Conference_Location
    London
  • ISSN
    1949-2081
  • Print_ISBN
    978-1-4244-8338-9
  • Type

    conf

  • DOI
    10.1109/GROUP4.2011.6053727
  • Filename
    6053727
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1956915