DocumentCode
1957777
Title
A room temperature electrically pumped 1.3-µm InAs quantum dot laser monolithically grown on silicon substrates
Author
Lee, A.D. ; Wang, T. ; Pozzi, F. ; Seeds, A.J. ; Liu, H.
Author_Institution
Dept. of Electron. & Electr. Eng., Univ. Coll. London, London, UK
fYear
2011
fDate
14-16 Sept. 2011
Firstpage
184
Lastpage
186
Abstract
We present a room-temperature 1.3-μm InAs/GaAs quantum dot laser monolithically grown on Si(100). The threshold current at 20°C was 725A/cm2 and the emission wavelength was 1.302μm. The laser was operated in pulsed mode. The growth was enabled via the optimisation of the temperature of the initial nucleation layer of GaAs.
Keywords
III-V semiconductors; indium compounds; integrated optics; laser modes; nucleation; optical pumping; quantum dot lasers; semiconductor growth; InAs; Si; emission wavelength; monolithic growth; nucleation layer; pulsed mode; room temperature electrically pumped quantum dot laser; silicon substrates; temperature 20 degC; temperature 293 K to 298 K; temperature optimisation; threshold current; wavelength 1.302 mum; Gallium arsenide; Laser modes; Photonics; Quantum dot lasers; Silicon; Substrates;
fLanguage
English
Publisher
ieee
Conference_Titel
Group IV Photonics (GFP), 2011 8th IEEE International Conference on
Conference_Location
London
ISSN
1949-2081
Print_ISBN
978-1-4244-8338-9
Type
conf
DOI
10.1109/GROUP4.2011.6053757
Filename
6053757
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