• DocumentCode
    1958700
  • Title

    Modification of second harmonic generation in silicon by strain and structuring

  • Author

    Schriever, Clemens ; Bohley, Christian ; Naumann, Falk ; de Boor, Johannes ; Lange, Jens ; Schilling, Jörg

  • Author_Institution
    Centre for Innovation Competence SiLi-nano, Martin-Luther-Univ. Halle-Wittenberg, Halle, Germany
  • fYear
    2011
  • fDate
    14-16 Sept. 2011
  • Firstpage
    308
  • Lastpage
    310
  • Abstract
    The influence of strain and lateral structuring on the reflected second harmonic signal in silicon is investigated. The obtained second-harmonic enhancement could be used in silicon waveguides to create a localized second order nonlinear susceptibility.
  • Keywords
    elemental semiconductors; optical harmonic generation; optical waveguides; silicon; Si; lateral structuring; second harmonic generation; second harmonic signal reflection; second order nonlinear susceptibility; silicon waveguides; strain; Gratings; Optical surface waves; Reflection; Silicon; Strain; Stress; Surface treatment;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Group IV Photonics (GFP), 2011 8th IEEE International Conference on
  • Conference_Location
    London
  • ISSN
    1949-2081
  • Print_ISBN
    978-1-4244-8338-9
  • Type

    conf

  • DOI
    10.1109/GROUP4.2011.6053799
  • Filename
    6053799
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1958700